Main   Site Map   Contact   Feedback   Useful Links  
About Planar Products Services R&D Support


Equipment for mask pattern generation and inspection

Multichannel laser generators

Pattern generators

Automatic mask inspection

Photomask inspection

Laser-based mask defect repair systems

Photorepeaters

Equipment for wafer pattern generation and inspection

Steppers

Large-area steppers

Pattern generator for wafers

Mask Aligners

Inspection of wafers and substrates

Chip Preparation Equipment

Probers

Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment

Microscopy, Optical Components

Microscopes

Optical Components
Aspherical parts
Spherical parts
Prisms
Wedges
Parallel-sided parts
Microlens Raster Components
Vacuum chucks
Antireflection coatings
Mirrors
Beamsplitters
Photolithography method
Bend Reflaction

Medical Equipment

Cardiology

Reanimation and intensive care

Surgery and trauma

Physiotherapy, neurology

Molds, Linear Step Motors, Sensors

Molds

Linear Step Motors

Step Motors, Sensors

Broadband Dielectric Mirrors


Material BK-7, fine annealed optical glass
Diameter Tolerance 12.7-101.6 mm (0.5-4.0 in.) +0/-0.13mm
152.4 - 203.2 mm (6.0 - 8.0 in.) +0/-0.25 mm
Center Thickness Tolerance (Tc) 12.7-101.6 mm (0.5-4.0 in.) 0.25 mm
152.4 - 203.2 mm (6.0 - 8.0 in.) 0.38 mm
Clear Aperture > central 80% of diameter
Chamfers 12.7 - 25.4 mm (0.5 - 1.0 in.) 0.25-0.76 mm face width x45 15
30-101.6 mm (1.181-4.0 in.) 0.38-1.14 mm face width x4515
152.4 - 203.2 mm (6.0 - 8.0 in.) 0.51-1.52 mm face width x45 15
S2 Surface Ground
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens
tissue are recommended
Damage Threshold 1000 W/cm2 CW, 10 mJ/cm2 with 10 nsec
pulses within the wavelength range

 

Wavelength Range (nm) Reflectivity (average) Angle of Incidence
488694 Rs, Rp >99% 0-45
700-950 Rs>99%,Rp>98% 0-45
632.8 Ravg >80% 0-45

High Energy Excimer Laser Mirrors

Material UV grade fused silica
S1 Surface Accuracy λ/10 at 632.8 nm over clear aperture
S2 Surface Flatness λ /10 at 632.8 nm over clear aperture
Clear Aperture > central 80% of diameter
Surface Quality 40 - 20 scratch-dig
Diameter Tolerance +0/-0.25 mm
Thickness Tolerance 0.5 mm
Wedge > 3 arc min
Chamfer 25.4 mm diameter: 0.250.76 mm face width x4515º
50.8 mm diameter: 0.381.14 mm face width x4515º
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended
Damage Threshold 1 MW/ cm2 CW, 1 wavelength J/cm2 with 10 nsec pulses at the center

 

Laser Type Central Wavelength (nm) Angle of Incidence Reflectivity
ArF 193 0 Runpol>98%
KrF 248 0 Rs, Rp>99%
XeCl 308 0 Rs, Rp>99%
XeF 351-353 0 Rs, Rp>99%
ArF 193 45 Runpol>95%
KrF 248 45 Rs, Rp>99%
XeCl 308 45 Rs, Rp>99%
XeF 351-353 45 Rs, Rp>99%

High Energy ND:Yag Laser Mirrirs

Material UV grade fused silica
Surface Flatness S1 λ /10 at 632.8 nm over clear aperture
Surface Flatness S2 λ /10 at 632.8 nm over clear aperture
Clear Aperture >= central 80% of diameter
Surface Quality 40 - 20 scratch-dig
Diameter Tolerance +0/-0.25 mm
Thickness Tolerance 0.5 mm
Wedge <= 3 arc min
Chamfer 25.4 mm diameter: 0.25-0.76 mm face width x4515
50.8 mm diameter: 0.38-1.14 mm face width x4515
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended
Damage Threshold 1064 nm: 5 MW/cm2 CW, 5 J/cm2 with 0.1-100 nsec pulses
532 nm: 2.5 MW/cm2 CW, 2.5 J/cm2 with 0.1-100 nsec pulses
354.7 nm: 1 MW/cm2 CW, 1 J/cm2 with 0.1-100 nsec pulses
266 nm: 1 MW/cm2 CW, 1 J/cm2 with 0.1-100 nsec pulses

 

Laser Type Wavelength (mm) Angle of Incidence Reflectivity
Nd:YAG (1) 1064 0 Rs>99.7%,Rp>99%
Nd:YAG (2) 532 0 Rs>99.7%,Rp>99%
Nd:YAG (3) 354.7 0 Rs>99.7/o,Rp>99%
Nd:YAG (4) 266 0 Rs>99.7%,Rp>99%
Nd:YAG (1) 1064 45 Rs>99.7%,Rp>99%
Nd:YAG (2) 532 45 Rs>99.7%,Rp>99%
Nd:YAG (3) 354.7 45 Rs>99.7%,Rp>99%
Nd:YAG (4) 266 45 Rs>99.7%,Rp>99%

Laser Broadband 45 Mirrors

Material BK-7, grade A, precision annealed optical glass
Surface Flatness λ /10 at 632.8 nm over clear aperture
Clear Aperture >= central 80% of diameter
Surface Quality 40 - 20 scratch-dig
Diameter Tolerance +0/-0.25 mm
Edge Thickness Tolerance (Te) 0.38 mm
Wedge 3015arc min
Chamfer 0.50.25 mm face width x45 15
Angle of Incidence 0-10
S1 Coating Rs>99%, 700-930 nm, Rp>99%, 730-870 nm
S2 Coating None
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended

Laser High Reflecting Pump Mirrors

Material BK-7, fine annealed optical glass
S1 Surface Accuracy Plano, λ /10 flatness at 632.8 nm over the clear aperture Concave, λ /5 irregularity at 632.8 nm over the clear aperture
S2 Surface Flatness Concave, λ /10 at 632.8 nm over clear aperture
Clear Aperture >= central 80% of diameter
Surface Quality 40 - 20 scratch-dig
Diameter Tolerance +0/-0.25 mm
Edge Thickness Tolerance (Te ) 0.25 mm
Wedge Flat mirror, 3015 arc. min
Chamfer 0.50.25 mm face width x45 15
Angle of Incidence 0-15
S1 Coating Rs,Rp>99%, 710-890 nm, Ts, Tp>95%, 488-532 nm, 0-20 AOI
S2 Coating Broadband, multilayer antireflection coating, Ravg <0.5%,430-700 nm, 0-15 AOI
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended
Laser Line Dielectric Mirrors

Specification

Diameter Tolerance 12.7-101.6 mm (0.5-4.0 in.) +0/-0.13mm
152.4 x 203.2 mm (6.0 x8.0 in.) +0/-0.25mm
Center Thickness Tolerance (Tc) 12.7-101.6 mm (0.5-4.0 in.) 0.25 mm
152.4 x203.2 mm (6.0 x 8.0 in.) 0.38 mm
Clear Aperture > central 80% of diameter
Chamfers 12.7 x25.4 mm (0.5 x 0.1 in.) 0.25-0.76 mm face width x45 15
30-101.6 mm (1.181-4.0 in.) 0.38-1.14 mm face width x45 15
152.4 x 203.2 mm (6.0 x 8.0 in.) 0.51-1.52 mm face width x45 15
S2 Surface Ground
Cleaning Non-abrasive method, acetone or isopropyl alcohol
on lens tissue are recomended
Damage Threshold WL=325 nm, 500 W/cm2 CW, 0.25 J/cm2
with 10 nsec pulses at 325nm
WL=1064 nm, 1000 W/cm2 CW, 10 J/cm2 with 10 nsec pulses
within the wavelength range
All others, 1000 W/cm2 CW, 0.5 J/cm2 with
10 nsec pulses within the wavelength range
Laser Type Central Wavelenght (nm) Wavelength Range (nm) Reflectivity Angle of Incidence
HeCd 325 325 Rs,Rp>99% 0-45
HeCd 441.6 441.6 Rs,Rp>99% 0-45
Argon-Iron 488514.5 488514.5 Rs,Rp>99% 0-45
HeNe 632.8 632.8 Rs,Rp>99% 0-45
Nd:YAG 1064 1030-1090 Rs,Rp>99% 0-45
Diode 1300 1290-1350 Rs,Rp>99% 0-45
Diode 1550 15201580 Rs,Rp>99% 0-45

Russian version
PLANAR
Planar Corporation
Site Search
 
Select a model


Other models of this section

2003 Planar
e-mail: planar@solo.by

www.redgraphic.com Web design and
development