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Equipment for mask pattern generation and inspection

Precision pattern generators

Special application pattern generator

Automatic mask inspection

Systems for inspection of work masks

Laser-based mask defect repair systems

Photorepeaters

Equipment for wafer pattern generation and inspection

Equipment for wafer projection imaging

Large-area steppers

Equipment for direct writing on wafers

Tools for proximity exposure and double-side lithography

Wafer inspection equipment

Chip Preparation Equipment

Probers

Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment

Microscopy

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Material Science

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Precision Photomasks and Reticles, Grids, Reading and Sighting Scales, Test Objects For Optical Devices And Microscopes

English MainProductsMicroscopyOptical Components › Photolithography method

Application: Precision optical and process equipment.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength
Pattern Arbitrary
Substrate Size Up to 178x 178 mm
Pattern Error over a 140140 mm Field 1 m
Certification Error 0.16 m
Radial Raster and Code Limbs And Disks, Analyzing Masks And Diaphragms Of Angular Encoders

Application: Precision processes, inspection and measurement equipment.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength
Working Field Diameter 6 - 150 mm
Number of Lines Up to 5000
Lines Step 6''
Linear, Radial and Special Focus Targets

Application: The targets are intended to check parameters (resolution, focus depth) of optical systems, objectives of optical devices, photolithographic lenses and materials, photolithographic processes.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength
Image Bright or dark field
Pattern Arbitrary
Minimum Feature Size 0.7 m
Working Field Up to 130 x 130 mm (100 x 100 mm for features under 2 m)
Line Standard Meters And Linear Raster Scales Of Linear Displacement Transducers

Application: Precision lithography, inspection and measurement, process and metrological equipment, CNC, computer numerical control machines.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength
Length Up to 630 mm (one) coordinate 160 x 160 mm two coordinates
Minimum Line Width 2 m
Raster Scale Pitch 4,8,10,16,20,40 m and more
Effect Filters

Application: Designed to create various effects in professional filming and photography, namely: fog, sharpness decrease, discontinuous beams, bright stars, etc.

Specifications

Material Glass, polymeric compound
Topology Microlenses, diffusers, gratings, radial and other lines (depending on the effect required)
Overall dimensions Ø40 to 200 mm
Depth 0.2 to 20 m

Russian version
PLANAR
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