Precision Photomasks and Reticles, Grids, Reading and Sighting Scales, Test Objects For Optical Devices And Microscopes

Application: Precision optical and process equipment.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength Pattern Arbitrary Substrate Size Up to 178x 178 mm Pattern Error over a 140х140 mm Field 1 µm Certification Error 0.16 µm

Application: Precision processes, inspection and measurement equipment.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength Working Field Diameter 6 - 150 mm Number of Lines Up to 5000 Lines Step 6''

Application: The targets are intended to check parameters (resolution, focus depth) of optical systems, objectives of optical devices, photolithographic lenses and materials, photolithographic processes.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength Image Bright or dark field Pattern Arbitrary Minimum Feature Size 0.7 µm Working Field Up to 130 x 130 mm (100 x 100 mm for features under 2 µm)

Application: Precision lithography, inspection and measurement, process and metrological equipment, CNC, computer numerical control machines.

Specifications

Substrate Material Chrome glass plates with antireflection coating for a necessary wavelength Length Up to 630 mm (one) coordinate 160 x 160 mm two coordinates Minimum Line Width 2 µm Raster Scale Pitch 4,8,10,16,20,40 µm and more

Application: Designed to create various effects in professional filming and photography, namely: fog, sharpness decrease, discontinuous beams, bright stars, etc.

Specifications

Material Glass, polymeric compound Topology Microlenses, diffusers, gratings, radial and other lines (depending on the effect required) Overall dimensions Ø40 to 200 mm Depth 0.2 to 20 µm