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Equipment for mask pattern generation and inspection

Precision pattern generators

Special application pattern generator

Automatic mask inspection

Systems for inspection of work masks

Laser-based mask defect repair systems


Equipment for wafer pattern generation and inspection

Equipment for wafer projection imaging

Large-area steppers

Equipment for direct writing on wafers

Tools for proximity exposure and double-side lithography

Wafer inspection equipment

Chip Preparation Equipment


Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment


Microelectronics Microscopes

Material Science


Medical Equipment


Aspherical parts

English MainProductsMicroscopyOptical Components › Aspherical parts

Application: Lighting systems.

Material BK 7, quality optical glass, fused silica
Diameter Max Ø 200 mm
Cylindrical parts radius 10 - 500 mm
Local error From 30 arc sec. to 5 arc min.
Parameter error 1%
Slope Not more than 40
Focal distance tolerance 7%
Surface quality 0.006-mm wide scratches of total length 2x over working aperture
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended

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