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Equipment for mask pattern generation and inspection

Precision pattern generators

Special application pattern generator

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Systems for inspection of work masks

Laser-based mask defect repair systems

Photorepeaters

Equipment for wafer pattern generation and inspection

Equipment for wafer projection imaging

Large-area steppers

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Tools for proximity exposure and double-side lithography

Wafer inspection equipment

Chip Preparation Equipment

Probers

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Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

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IC Pretreatment Equipment

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Aspherical parts

English MainProductsMicroscopyOptical Components › Aspherical parts

Application: Lighting systems.

Material BK 7, quality optical glass, fused silica
Diameter Max Ø 200 mm
Cylindrical parts radius 10 - 500 mm
Local error From 30 arc sec. to 5 arc min.
Parameter error 1%
Slope Not more than 40
Focal distance tolerance 7%
Surface quality 0.006-mm wide scratches of total length 2x over working aperture
Cleaning Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended

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