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Equipment for mask pattern generation and inspection

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Broadband Multilayer Antireflection Coatings

English MainProductsMicroscopyOptical Components › Antireflection coatings

Specifications:

Substrate Material

For BK 7 and fused silica

Cleaning

Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended

Damage Threshold

100 W/cm2 CW, 1 J/cm2 with 10 nsec pulses at 32525 nm

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 532 nm

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 1064 nm

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 1064 nm

Wavelength Range (nm) Center Wavelength (nm) Reflectivity Incidence Angle of
245-440 320 Ravg<0.5%,Rmax<1.0% 0-15o
430-700 530 Ravg<0.5%,Rmax<1.5% 0-15o
650-1000 790 Ravg<0.5%,Rmax<1.5% 0-15o
1000-1150 1210 Ravg<0.5%,Rmax<1.5% 0-15o
Laser Line Antireflection V-Coatings

Specifications:

Substrate Material

For BK 7 and fused silica

Cleaning

Non-abrasive method, acetone or isopropyl alcohol on lens tissue are recommended

Damage Threshold

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 488/514.5 nm

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 532 nm

1000 W/cm2 CW

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 694 nm

100 W/cm2 CW, 2 J/cm2 with 10 nsec pulses at 1064 nm.

Center Wavelength (nm) Reflectivity Angle of Incidence
488-514.5 Rmax<0.25% 0-15
532 Rmax<0.25% 0-15
632.8 Rmax<0.25% 0-15
694 Rmax<0.25% 0-15
1064 Rmax<0.25% 0-15

Russian version
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