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Equipment for mask pattern generation and inspection

Precision pattern generators

Special application pattern generator

Automatic mask inspection

Systems for inspection of work masks

Laser-based mask defect repair systems


Equipment for wafer pattern generation and inspection

Equipment for wafer projection imaging

Large-area steppers

Equipment for direct writing on wafers

Tools for proximity exposure and double-side lithography

Wafer inspection equipment

Chip Preparation Equipment


Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment


Microelectronics Microscopes
MICRO 200-01, MICRO 200T-01
MK-1, MK-1T

Material Science


Medical Equipment


A set of parts for polarization and DIC (Nomarsky) contrasts, TV- and photo-adapters. The following sets can be delivered on order: microscope-adapter-camera-PC (monitor)-software.

Binocular tube of the trinocular attachment is easily adjustable to the operators eye basis. The distance between the eyepieces is in the range of 55... 75 mm, angle 0...45 degr.

Scale factor on coarse stage travel knob is 0.5 mkm, enabling Z travel in the range of 0-27 mm. The sensitivity of coaxially positioned fine movement knob is 0.05 mm / revolution.

Quintuple motorized nosepiece for BF/DF objectives. Clockwise, counter-clockwise rotation with high positioning accuracy.

Object stage handle with fixation knob for fast coarse movement.

Selection of a required objective is performed from the control panel. The objectives can rotate from the control buttons clockwise or counter-clockwise.

The control panel also contains light indication of an objective in the working area and lamp illumination adjustment knob.

Objectives with longer working distances

MICRO 200-01 and MICRO 200T-01 Microscopes

English MainProductsMicroscopyMicroelectronics Microscopes › MICRO 200-01, MICRO 200T-01

The microscopes are intended for inspection of semiconductor wafers and photomasks in production of various radioelectronic devices and also for research in other fields of science and technology.
The microscope's design is highly ergonomic.  It allows adjusting the tilt of the trinocular tube  for operator's convenience, adjusting the eye base and to carry out dioptric  adjustment for operator's eyesight in a broad range The magnification change is made through an electromechanical drive. An option is envisaged for fine and coarse accelerated displacement of the object stage and for easy switching between the modes. All this makes the work at the microscope not tiring.

Object observation modes:
 bright and dark fields in reflected light  (MICRO200-01);
 bright field in reflected light, bright and dark fields in reflected light (MICRO200-01);
 polarization and differential-interference contrast.

Basic model specifications of the MICRO 200-01 microscope
Objectives (planapochromats) 5x 10x 20x 50x 100x
 numerical aperture 0.15 0.30 0.45 0.80 0.90
 objective working distance, mm 5.60 2.25 1.25 0.55 0.32
 magnification, x 50 100 200 500 1000
 linear field of view, mm, no less than 4.40 2.10 1.10 0.45 0.18
 resolution, lines/mm, no less than 400 750 1200 1800 2400
Maximal magnification, x (with options) 4500
Nosepiece quintuple motorized
Object stage manually controlled
Stage travel along X, Y, mm, no less than 200x200
Stage travel along Z, mm, no less than 27
Sensitivity of fine focusing, mm/revolution 0.05
Power requirements ~ 230V, 50Hz / 200W
Overall dimensions, mm 750x530x500
Weight, kg 45
Barrel lenses, X 1,5; 2,0
Eyepieces, X 10 ; 12,5 (with grid); 12,5; 15
Wafer holder, inch 3...8
Mask holder, inch 3...7
Objectives (planapochromats) 5x 10x 20x 50x 80x 100x
 numerical aperture 0.10 0.17 0.38 0.50 0.65 0.70
 objective working distance, mm 16.3 22.4 12.8 11.5 2.9 3.3
 magnification, x 50 100 200 500 1000
 linear field of view, mm, no less than 4.60 2.30 1.15 0.46 0.29 0.23
 resolution, lines/mm, no less than 250 500 1100 1350 1800 1800
Base, mm 45
Thread M27x0.75

Barrel lenses (1,5x and 2x) enhance total magnification of the microscope in 1.5 and 2 times, respectively

Eyepieces Field of view(grid scale factor)
10x, mm 23
10x with grid 0.05 mm, mm 23
12.5x, mm 18
12.5x with grid 0.05 mm, mm 18
15x, mm 17

Polarization contrast kit is used for research of objects having anisotropy and together with Nomarsky prism for DIC mode.

For microscope-based micro-inspection stations we offer various TV- and photo-adapters, video- and photo-cameras.

Russian version
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