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Equipment for mask pattern generation and inspection

Precision pattern generators

Special application pattern generator

Automatic mask inspection

Systems for inspection of work masks

Laser-based mask defect repair systems


Equipment for wafer pattern generation and inspection

Equipment for wafer projection imaging

Large-area steppers

Equipment for direct writing on wafers

Tools for proximity exposure and double-side lithography

Wafer inspection equipment

Chip Preparation Equipment


Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment


Microelectronics Microscopes

Material Science
MK-3, MK-3T


Medical Equipment


Microscope MI-2

MI-2 and MI-2T inverted microscopes are intended for a wide scope of tasks in various fields of science, technology, and education.

Low weight and small dimensions make them ideal for quick research.

Object observation modes:
 bright fields by reflected light (MI-2);
 bright field in transmitted light (MI-2T);
 polarization contrast;
 Nomarsky DIC.

Basic model specifications
planachromats, magn./NA 5/0.15; 10/0.25; 20/0.4; 50/0.5
planapochromats*, magn./NA 50/0.8; 80/0.65; 100/0.9
planapochromats with enlarged working distance*, magn./NA 50/0.5; 100/0.7
Eyepieces 10; 12.5*
Nosepiece 4-manually
Object stage Rotary manually controlled
Stage travel along XY, mm 60x40
Stage rotation along Z, deg 15
Sensitivity of fine focussing, mkm/deg 0.25
Light halogen lamp 30 W, 100W*
Overall dimensions, mm 250x550x400
Weight, kg 13
* options

Russian version
Planar Holding
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