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Equipment for mask pattern generation and inspection

Multichannel laser generators

Pattern generators

Automatic mask inspection

Photomask inspection

Laser-based mask defect repair systems

Photorepeaters

Equipment for wafer pattern generation and inspection

Steppers

Large-area steppers

Pattern generator for wafers

Mask Aligners

Inspection of wafers and substrates

Chip Preparation Equipment

Probers

Wafer Grinders

Dicing Saws

Die Control and Cassetting Systems

Assembly and Packaging Equipment, Laser Processing

Die Bonders

Wire Bonders

Wafer Bonders

IC Pretreatment Equipment

Laser Processing Equipment

Microscopy, Optical Components

Microscopes
MICRO 200-01, MICRO 200T-01
MI-1
MI-2
MK-1, MK-1T
MK-3, MK-3T
MK-AM

Optical Components

Medical Equipment

Cardiology

Reanimation and intensive care

Surgery and trauma

Physiotherapy, neurology

Molds, Linear Step Motors, Sensors

Molds

Linear Step Motors

Step Motors, Sensors

Microscope MI-2


MI-2 and MI-2T inverted microscopes are intended for a wide scope of tasks in various fields of science, technology, and education.

Low weight and small dimensions make them ideal for quick research.

Object observation modes:
 bright fields by reflected light (MI-2);
 bright field in transmitted light (MI-2T);
 polarization contrast;
 Nomarsky DIC.

Basic model specifications
Objectives:
planachromats, magn./NA 5/0.15; 10/0.25; 20/0.4; 50/0.5
planapochromats*, magn./NA 50/0.8; 80/0.65; 100/0.9
planapochromats with enlarged working distance*, magn./NA 50/0.5; 100/0.7
Eyepieces 10; 12.5*
Nosepiece 4-manually
Object stage Rotary manually controlled
Stage travel along XY, mm 60x40
Stage rotation along Z, deg 15
Sensitivity of fine focussing, mkm/deg 0.25
Light halogen lamp 30 W, 100W*
Overall dimensions, mm 250x550x400
Weight, kg 13
* options

Russian version
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e-mail: planar@solo.by

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